Vacuum Coating Machine (Arc Evaporation)
The cathode may be any of metals, including copper, titanium, nickel, and chromium. In some cases, the free metal ions react with the ionized gas (i.e. nitrogen) contained in the plasma environment to form a metal compound for coating, such as titanium nitride, titanium carbide, and zirconium nitride.
Arc vaporization uses a cathode as the source of deposition. Therefore, the process is also known as cathodic arc vaporization, or cathodic arc plasma deposition. Highlighted on this page is the vacuum coating machine that can conduct the arc vaporization process and has found wide use in metatallizing watches, door locks, crockery, kitchenware, eyeglass frames, luminaire, bathroom fixtures and more.
As a specialized vacuum coating machine provider, we can customize your vacuum coater or vacuum metallizer to suit your specific coating requirements.
Features of Vacuum Coating Machine
1. A user-friendly touch-screen, coupled with advanced PLC system, allows vacuum coating machine operator to control the speed of the vacuum pump and monitor the level of vacuum via a vacuometer.
2. Both cathode power supply and bias voltage supply come with a voltage converter. Heating tubes are mounted to the side of the vacuum chamber. PID controller maintains a constant temperature in the chamber.
3.Cathodic arc plasma vaporization offers a high degree of ionization. The resulting metal ions are high energy, enabling metals to be deposited faster than traditional PVD processes.
4. Easy operation, low operating costs, maximum productivity, no health risk, no pollution to the surrounding environment
5. Arc vaporization technology produces fine depositions and enhanced barrier performance.
6. This vacuum coater can complete the entire process in the shortest possible time.
Specs | |||||
Vacuum chamber size | ф900 ×1000 | ф1100 ×1200 | ф1250 ×1100 | ф1300 ×1500 | |
Vacuum pump speed | 1×105 Pa~3×10-3 Pa≤20min | ||||
Maximum Vacuum | ≤1×10-3 Pa | ||||
Auxiliary equipment | KT-500 /2X-70 /2X-15/ZJP-300 Optional Pumps: F-400/3600 molecular pump (replacement of KT-500) | KT-630 /2X-70/ 2X-15 /ZJP-300 Optional Pumps: F-400/3600 molecular pump (replacement of KT-630) | KT-630 /2X-70 /2X-15 /ZJP-300 Optional Pumps: F-400/3600 molecular pump (replacement of KT-630) | KT-630 /2X-70 /2X-15 /ZJP-300 Optional Pumps: F-400/3600 molecular pump (replacement of KT-630) | |
Transmission | Planetary gear (rotation and revolution), no. of rotary shafts: 8-16, as per customer requirements | ||||
Heating method | Stainless steel heating tubes along the side of the vacuum chamber | ||||
Ion bombardment | Pulse voltage: 0-1000V high voltage | ||||
Gas supply | Gas flow control | ||||
No. of cathodes (targets) | 6 (electric arcs) | 8 (electric arcs) | 8-10 (electric arcs) | 8-12 (electric arcs) | |
No. of magnetically controlled targets | 1-2 (flat or cylindrical) | 1-2 (flat or cylindrical) | 1-4 (flat or cylindrical) | 1-4 (flat or cylindrical) | |
Operating mode | PLC semi-automatic mode or PC PLC full automatic mode PLC brands (Siemens and Schneider) | ||||
Gas environment | Ar , N2, O2, C2H2 | ||||
Total power | 40KW | 40-60KW | 60-80KW | 70-90KW | |
Compressed air pressure | 0.4~0.8MPa | ||||
Water cooling system | Water pressure/temperature: ≤25 ℃ /≥0.25MPa (Currently out of stock) |